APL2100 series

High Energy Picosecond Amplifiers
  • Flash lamp pumped picosecond amplifiers
  • Pulse energies up to 2.2 J
  • 30 – 90 ps pulses
  • 10 Hz pulse repetition rate.
  • Flash lamp pumped picosecond amplifiers
  • Pulse energies up to 2.2 J
  • 30 – 90 ps pulses
  • 10 Hz pulse repetition rate.

Features & Applications


  • Diode pumped regenerative amplifier
  • Seeding of regenerative amplifier with customers super-continuum seeding source
  • Wide selection of seeders available
  • Flashlamp pumped power amplifier
  • Advanced beam shaping for high pulse energy
  • Thermally induced birefringence compensated design for high pulse repetition rates
  • Low jitter synchronisation pulses for streak camera triggering with 10 ps rms jitter (optional)
  • Water-water heat exchanger for cooling of pump chambers
  • Remote control pad
  • Control through CAN or USB interface (RS232 and LAN is optional)
  • Optional temperature stabilized second, third and fourth harmonic generators


  • OPCPA pumping
  • OPG/OPA pumping
  • Other spectroscopic and nonlinear optics applications…


APL210x series amplifiers are designed to produce up to 2200 mJ picosecond pulses. High pulse energy, excellent pulse-to-pulse energy stability, superior beam quality makes APL210x series picosecond amplifiers well suited for applications like OPCPA pumping, non-linear optics and others. Ekspla can offer a seeder meeting customer’s requirements.

Regenerative amplifier / Power amplifier design

APL210x series amplifiers are designed to be seeded by external seeding source. Diode pumped regenerative amplifier ensures amplification of seed signal to stable mJ level pulse for amplification in linear amplifiers. Advanced beam shaping ensures smooth, without hot spots beam spatial profile at the laser output. Low light depolarization level allows high efficiency generation of up to 4th harmonic with optional build-in harmonic generators.

Build-in harmonic generators

Angle-tuned DKDP crystals harmonic generators mounted in temperature stabilized heaters are used for second, third and fourth harmonic generation. Harmonic separation system is designed to ensure high spectral purity of radiation and direct it to the output ports.

Simple and convenient laser control

For customer convenience the amplifier can be controlled through remote control pad or USB interface. The control pad features a backlit display that is easy to read even while wearing laser safety eyewear. Alternatively, the amplifier can be controlled from personal computer with supplied software for Windows™ operating system. LabVIEW™ drivers are supplied as well. Repetition rate and timing of the pulses can be locked to the external RF source (with –PLL option) or other ultrafast laser system (with –FS option).


Output energy
    at 1064 nm200 mJ300 mJ550 mJ1000 mJ2200 mJ
    at 532 nm 2)100 mJ150 mJ250 mJ500 mJ1100 mJ
    at 355 nm 3)60 mJ90 mJ170 mJ300 mJinquire
    at 266 nm 4)20 mJ30 mJ60 mJ100 mJinquire
Pulse energy stability (Std.Dev.) 5)
    at 1064 nm1.5 %
    at 532 nm2.5 %
    at 355 nm5 %
    at 266 nm7 %
Pulse duration (FWHM)6)90 ± 10 ps
Pulse repetition rate 7)10 Hz
Triggering modeexternal
Spatial mode 8)super-Gaussian
Beam divergence 9)< 0.5 mrad
Typical beam diameter 10)~11 mm~17 mm~24 mm
Beam pointing stability 5)< ±60 μrad
Pre-pulse contrast> 200:1
Polarizationlinear, > 100:1
Wavelength1064 nm
Pulse duration range (FWHM)20 – 90 ps
Pulse repetition rate50 – 95 MHz
Average power> 20 mW
Laser head size (W×L×H)600 × 1500 × 350 mm600 × 1800 × 350 mmTBA
Power supply size (W×L×H)550 × 600 × 1100 mm550 × 600 × 1230 mmTBA
Water service< 12 l/min, below 20 °C< 25 l/min, below 20 °C
Relative humidity20 – 80 % (non condensing)
Operating ambient temperature22±2 °C
Mains voltage208 or 230 V AC, single phase, 50/60 Hz220, 380 or 400 V AC, three phases, 50/60 Hz
Power rating 11)< 2 kVA< 2 kVA< 2.5 kVA< 4.5 kVA< 12 kVA
  1. Due to continuous improvement, all specifications are subject to change. Parameters marked typical are illustrative; they are indications of typical performance and will vary with each unit we manufacture. Unless stated otherwise, all specifications are measured at 1064 nm and for basic system without options.
  2. For APL210x-SH and APL210x-SH/FH options. Outputs are not simultaneous.
  3. For APL210x-TH option. Outputs are not simultaneous.
  4. For APL210x-SH/FH option. Outputs are not simultaneous.
  5. Rms, measured over 30 s.
  6. Optional 30 ps duration. Inquire for pulse energies.
  7. Should be specified when ordering. Inquire for custom pulse repetition rates.
  8. Gaussian fit >80%.
  9. Full angle measured at the 1/e² level at 1064 nm.
  10. Beam diameter is measured at 1064 nm at the 1/e² level.
  11. Required current rating can be calculated by dividing power rating by mains voltage.

Note: Laser must be connected to the mains electricity all the time. If there will be no mains electricity for longer that 1 hour then laser (system) needs warm up for a few hours before switching on.

Available Models & Options

APL2101Delivers 200 mJ, 90 ps pulses at up to 10 Hz repetition rate
APL2103Delivers 300 mJ, 90 ps pulses at up to 10 Hz repetition rate
APL2105Delivers 550 mJ, 90 ps pulses at up to 10 Hz repetition rate
APL2106Delivers 1000 mJ, 90 ps pulses at up to 10 Hz repetition rate
APL2107Delivers 2200 mJ, 90 ps pulses at up to 10 Hz repetition rate


  • Option P30. Provides 30±3 ps output pulse duration. Contact EKSPLA for pulse energy specifications.
  • Seeder. Optional seeder can be provided on request.
  • Option FS. External seeder input via motorized spectral broadening stage for APL2100 series.
  • Option PLL. Precise trigger to external RF signal with jitter < 1 ps.
  • AW Water-air cooling option. Water-air cooling unit or chiller for APL2100 series.
  • 20 Hz option. 20 Hz output at all wavelengths with reduced energy output
  • Multiple channel option. Multiple outputs of same or different wavelength/energy are available.


Found total :
3 articles, 3 selected
Application selected :
All Applications
All Applications
Scientific Applications
High Intensity Sources – laser produced plasma, x-ray source, extreme UV
OPCPA Systems – optical parametric chirped pulse amplification system
Plasma Physics
Laser Spectroscopy
Fluorescence Spectroscopy
Time-resolved Spectroscopy

Quantitative picosecond laser-induced fluorescence measurements of nitric oxide in flames

Related applications:  Laser Spectroscopy Fluorescence Spectroscopy Time-resolved Spectroscopy

Authors:  Christian Brackmann, Joakim Bood, Jenny D. Nauclér, Alexander A. Konnov, Marcus Aldén

Quantitative concentrations measurements using time-resolved laser-induced fluorescence have been demonstrated for nitric oxide (NO) in flame. Fluorescence lifetimes measured using a picosecond Nd:YAG laser and optical parametric amplifier system have been used to directly compensate the measured signal for collisional quenching and evaluate NO concentration. The full evaluation also includes the spectral overlap between the ∼15 cm−1 broad laser pulse and multiple NO absorption lines as well as the populations of the probed energy levels. Effective fluorescence lifetimes of 1.2 and 1.5 ns were measured in prepared NO/N2/O2 mixtures at ambient pressure and temperature and in a premixed NH3-seeded CH4/N2/O2 flame, respectively. Concentrations evaluated from measurements in NO/N2/O2 mixtures with NO concentrations of 100–600 ppm were in agreement with set values within 3% at higher concentrations. An accuracy of 13% was estimated by analysis of experimental uncertainties. An NO profile measured in the flame showed concentrations of ∼1000 ppm in the post-flame region and is in good agreement with NO concentrations predicted by a chemical mechanism for NH3 combustion. An accuracy of 16% was estimated for the flame measurements. The direct concentration evaluation from time-resolved fluorescence allows for quantitative measurements in flames where the composition of major species and their collisional quenching on the probed species is unknown. In particular, this is valid for non-stationary turbulent combustion and implementation of the presented approach for measurements under such conditions is discussed.

Published: 2016.   Source: Proceedings of the Combustion Institute, vol. 36:3, pp. 4533-4540 (2017)

Table top TW-class OPCPA system driven by tandem femtosecond Yb:KGW and picosecond Nd:YAG lasers

Related applications:  OPCPA Systems

Authors:  T. Stanislauskas, R. Budriūnas, R. Antipenkov, A. Zaukevičius, J. Adamonis, A. Michailovas, L. Giniūnas, R. Danielius, A. Piskarskas, A. Varanavičius

We present a compact TW-class OPCPA system operating at 800 nm. Broadband seed pulses are generated and pre-amplified to 25 mJ in a white light continuum seeded femtosecond NOPA. Amplification of the seed pulses to 35 mJ at a repetition rate of 10 Hz and compression to 9 fs is demonstrated.

Published: 2014.   Source: Optical Society of America | Vol. 22, No. 1 | DOI:10.1364/OE.22.001865 | OPTICS EXPRESS 1865

Emission properties of ns and ps laser-induced soft x-ray sources using pulsed gas jets

Related applications:  High Intensity Sources Plasma Physics

Authors:  M. Müller, F.-Ch. Kühl, P. Großmann, P. Vrba, K. Mann

The influcence of the pulse duration on the emission characteristics of nearly debris-free laser-induced plasmas in the soft x-ray region (λ ≈1-5 nm) was investigated, using six different target gases from a pulsed jet. Compared to ns pulses of the same energy, a ps laser generates a smaller, more strongly ionized plasma, being about 10 times brighter than the ns laser plasma. Moreover, the spectra are considerably shifted towards shorter wavelengths. Electron temperatures and densities of the plasma are obtained by comparing the spectra with model calculations using a magneto-hydrodynamic code.

Published: 2013.   Source: Opt. Express 21, 12831-12842 (2013)

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